منابع مشابه
Generalized inverse lithography methods for phase-shifting mask design.
Optical proximity correction (OPC) and phase shifting masks (PSM) are resolution enhancement techniques (RET) used extensively in the semiconductor industry to improve the resolution and pattern fidelity of optical lithography. In this paper, we develop generalized gradient-based RET optimization methods to solve for the inverse lithography problem, where the search space is not constrained to ...
متن کاملInverse Synthesis of Phase-Shifting Mask for Optical Lithography
We applied an inverse synthesis method to design phase-shifting mask (PSM) via gradient descent optimization under the coherent illumination assumption. The synthesized PSMs have high fidelity and sharp image slope. ©2007 Optical Society of America OCIS codes: (100.3190) Inverse problems; (110.5220) Photolithography
متن کاملLine Search-Based Inverse Lithography Technique for Mask Design
As feature size is much smaller than the wavelength of illumination source of lithography equipments, resolution enhancement technology (RET) has been increasingly relied upon to minimize image distortions. In advanced process nodes, pixelated mask becomes essential for RET to achieve an acceptable resolution. In this paper, we investigate the problem of pixelated binary mask design in a partia...
متن کاملBinary and Phase Shifting Mask Design for Optical Lithography
We propose a number of pre-distorted mask design techniques for binary and phase-shifting masks. Our approach is based on modeling the imaging mechanism of a stepper by the Hopkins equations and taking advantage of the contrastenhancement characteristics of photoresist. Optimization techniques such as the branch and bound algorithm and simulated annealing algorithm are used to systematically de...
متن کاملBinary mask optimization for inverse lithography with partially coherent illumination.
Recently, a set of generalized gradient-based optical proximity correction optimization methods have been developed to solve for the inverse lithography problem under coherent illumination. Most practical lithography systems, however, operate under partially coherent illumination. This paper focuses on developing gradient-based binary mask optimization methods that account for the inherent nonl...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2008
ISSN: 1094-4087
DOI: 10.1364/oe.16.000663